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NF3
“NF3-a gas to prevent dust or other particle contamination in TFT (Thin Film Transistor) and semiconductor production"
NF3 is used in the mabufacturing process of semiconductors, TFT-LCD and solar cells. After deposition sithin the CVD chamber, NF3 is injected to remove any residues on the internal walls of the chamver.
Injectde NF3 chemically reacts with residues in the chamber to remove them.
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Specification |
Analyzer |
| Purity |
NF₃ |
99.999% |
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| Impurity |
O₂+Ar |
<1.0 ppm |
GC |
| N₂ |
<1.0 ppm |
GC |
| CF₄ |
<10.0 ppm |
GC |
| CO₂ |
<1.0 ppm |
GC |
| N₂O |
<1.0 ppm |
GC |
| SF6 |
<1.0 ppm |
GC |
| CO |
<1.0 ppm |
GC |
| HF |
<1.0 ppm |
IC |
| H₂O |
1.0 ppm |
Hygrometer |
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47ℓ |
Bundle |
Y-cylinder |
20ft ISO-Container |
40ft ISO-Container |
| Filling |
20/22.7Kg |
320/360Kg |
200Kg |
4,200Kg |
8,000kg |
| Container Material |
Mn-Steel |
CR-MO Steel |
| Valve |
DISS 640, CGA 330, JIS22 14R/L |
DISS 640 |
| Shelf Life |
1 year |
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| Domestic |
Oversea |
Samsung ElectronicsHynix
Semiconductor
Dongbuhitek
LG Phillips LCD
BOE-HYDIS |
Taiwan
Japan
China
Southeastern Asia |
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http://www.ocim.co.kr/eng2
