NF3
SiH4
WF6
DCS
GRAPHITE
 
http://www.ocim.co.kr/eng2
 

DCS

DCS(SiH2 Cl2) is used in the semiconductor process.
This is a silicon precursor gas used in combination with ammonia for SiH4 CVD.
DCS is also used for edposition of epitaxial silicon.


 
  Specification Analyzer
Purity SiH₂Cl₂(DCS) 99.5%  
Impurity O₂+Ar ≤ 1.0 ppmv GC
N₂ ≤ 1.0 ppmv GC
CO ≤ 1.0 ppmv GC
CO₂ ≤ 1.0 ppmv GC
CH₄ ≤ 1.0 ppmv GC
H₂ ≤ 10.0 ppmv GC
SiH₃Cl(MCS) ≤ 1000 ppmv GC
SiHCl₃(TCS) ≤ 500 ppmv GC
SiCl₄(STC) ≤ 500 ppmv GC
 
Type 40ℓ 10ℓ
Filling 37Kg 9Kg
Container Material SUS316L
Valve JIS22-14L
Shelf Life 1year
 
 
     
[712-749] #413, Yeongnam Uiversity Central Library, 214-1, Dae-dong, Gyeongsan-si , Gyeongsangbuk-do, S. KOREA
TEL. +82-53-810-3276    FAX. +82-53-811-3041